Open Call: The New York Community Trust’s Edward and Sally Van Lier Fund Residencies

Call
International Studio & Curatorial Program (ISCP)

The International Studio & Curatorial Program (ISCP) is pleased to announce an open call for four fully-funded residencies supported by the The New York Community Trust’s Edward and Sally Van Lier Fund. 

ISCP is currently accepting applications from talented, culturally diverse, and economically disadvantaged young artists based in New York City who would like to engage with ISCP’s dynamic programming and creative community. The residency includes participation in all of ISCP’s residency program activities; in addition to a private studio space and a stipend for accommodation and living expenses. 

Benefits include:

  • $3,000 monthly stipend
  • A solo exhibition in ISCP’s project space
  • A $750 materials budget
  • 24-hour access to a private furnished studio space
  • Participation in Open Studios
  • Regular studio visits from Visiting Critics
  • Field Trips to museums, galleries and other cultural venues
  • Opportunity for a public talk
  • Becoming part of a growing network of 1,800+ international artists and curators who are ISCP alumni

Eligibility: Visual artists who identify as a person of color working in all media are invited to apply. Artists must be age 35 and under; residents of one of the five boroughs of New York City for a minimum of one year prior to application date; be eligible to work in the United States; and demonstrate financial need. Applicants may not be ISCP alumni, residents in another studio program at the same time as The New York Community Trust Van Lier Residency, or enrolled in school.

  • Application deadline: December 28, 2023
  • Notification date: February 1, 2024. 
  • Residency dates:
    • August 1, 2024–January 31, 2025
    • September 1, 2024–February 29, 2025
    • October 1, 2024–March 31, 2025
    • January 1, 2025–June 30, 2025

Click here to learn about the application process and eligibility.
Click here to download the application.